期刊
ACS APPLIED MATERIALS & INTERFACES
卷 9, 期 50, 页码 44053-44059出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.7b18035
关键词
carbon nanotube; plasma; sputtering; polymer; nanostructure
资金
- Human Resources Program in Energy Technology of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) from the Ministry of Trade, Industry Energy [20164030201380]
- National Research Foundation of Korea (NRF) - Ministry of Education, Republic of Korea [NRF-2015R1D1A1A01057417]
We investigate the interaction of carbon nanotubes (CNTs) embedded in a polymer matrix [poly(methyl methacrylate) (PMMA)] with Ar plasma, which results in the formation of PMMA nanostructures, as CNTs act as an etching mask. Because of the large differences in the Ar ion sputtering yields between CNTs and PMMA, PMMA lines with the width comparable to that of CNTs and as, high as 20 nm (for single-walled CNTs) or 80 nm (for multiwalled CNTs) can be obtained after repeated exposure of CNT/PMMA films to Ar plasma. We also follow the etching process by investigating changes in the IV characteristics and Raman spectra of CNTs after each exposure to Ar plasma, which shows progressive defect generations in CNTs while they maintain structural integrity long enough to act as the etching mask for PMMA underneath. We demonstrate that the PMMA nanotructure patterns can be transferred to a different polymer substrate using nanoimprinting.
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