Grain boundaries and dislocations in Si-bricks: inline characterization on as-cut wafers

In High-Performance mc-Si [1] random grain boundaries, although being recombination active, often enhance material quality by reducing dislocations. With this work, we take a step towards statistical large-scale investigations of crystal defects via a combined analysis of different inline-measurements on as-cut wafers: photoluminescence images for the extraction of recombination-active structures and reflection and infrared transmission images for the extraction of the grain structure. The combined extraction of recombination-active structures and grain structures allows isolating dislocations from grain boundaries for all material types. To discern dislocations from other recombination-active defect structures, an image-processing-based analysis technique has been developed. By applying this separation on wafers from various bricks of our material set, typical developments of grain structure and dislocations can be identified. As a particular application, we investigate the correlation between the development of dislocations in higher parts of the brick and grain size in the lower parts. The results support theory quantitatively: Dislocation ratio in the upper brick part shows a correlation with the square root of the weighted median of the grain size in the lower brick part (R approximate to 0.85). However, the results also show that grain size distribution, in particular grain size homogeneity, has to be considered to account for a stronger distinction between materials. (C) 2017 The Authors. Published by Elsevier Ltd.