期刊
UKRAINIAN JOURNAL OF PHYSICS
卷 63, 期 4, 页码 362-369出版社
BOGOLYUBOV INST THEORETICAL PHYSICS NATL ACAD SCI UKRAINE
DOI: 10.15407/ujpe63.4.362
关键词
rubrene; Alq3; oxidized rubrene; vacuum deposition; thin films; FTIR spectra; photoluminescence
We report on the optical and structural characterization of the two-component vacuum deposited (VD) rubrene (Rub)-Alq3 films. As is known, Rub-doped OLED active materials demonstrate both promising electroluminescence and transistor characteristics. However, in terms of operational lifetime, the Rub practical application in basic devices has a few drawbacks related to its chemical instability. Our main attention was focused on the role of the Alq3 coverage and the isomeric transformation of a Rub molecule on its chemical stability in these structures. By monitoring the evolution of PL emission in time, we found that the Rub degradation in Rub-Alq3 films is slower than that in vacuum-deposited Rub layers. These results demonstrate that the deposition of an Alq3 layer can be a way to enhance the stability of Rub to the photo-oxidation in optoelectronic devices. The Rub amorphous film crystallization at elevated temperatures in open air was observed for the first time.
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