4.6 Article Proceedings Paper

Silicon carbide thin films with different processing growth as an alternative for energetic application

期刊

OPTICAL MATERIALS
卷 65, 期 -, 页码 117-123

出版社

ELSEVIER
DOI: 10.1016/j.optmat.2016.09.027

关键词

Silicon carbide; Thin films; Plasma; Crystalline structure; Amorphous films

资金

  1. National Research of DGRSDT/MESRS, Algeria

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Different SiC thin film structures were obtained depending on the deposition techniques. Crystalline films were grown using a Pulsed laser deposition (PLD), in contrary the sputtering DC magnetron method allow to have an amorphous films (a-SiC:H and a-Sii_xCx:H). A comparative study of the structural and optical characteristics of the elaborated films has been performed. The energetic application possibilities such as blue or multicolor LEDs have been explored. Different techniques have been used to investigate the elaborated films such as SEM-EDS, SIMS, photoluminescence and spectral response. (C) 2016 Elsevier B.V. All rights reserved.

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