Electrospun p-Type Nickel Oxide Semiconducting Nanowires for Low-Voltage Field-Effect Transistors

One-dimensional metal-oxide nanowires are regarded as important building blocks in nanoscale electronics, because of their unique mechanical and electrical properties. In this work, p-type nickel oxide nanowires (NiO NWs) were fabricated by combining sol-gel and electrospinning processes. The poly(vinylpyrrolidone) (PVP) with a molecular weight of 1 300 000 was used as the polymer matrix to increase the viscosity of a NiO precursor solution. The formation and properties of the as-spun NiO/PVP composite NWs before/after calcination treatment were investigated using various techniques. Because of the enhanced adhesion properties between ultraviolet (UV)-treated NiO NWs and the substrate, the field-effect transistors (FETs) based on NiO NWs were found to exhibit satisfying p-channel behaviors. For the fabrication of aligned NiO NW arrays, two parallel conducting Si strips were grounded as NW collector. The integrated FETs based on aligned NiO NWs were demonstrated to exhibit superior electrical performance, compared to the disordered counterparts with the comparable NW coverage. By employing high-k aluminum oxide (Al2O3) as a dielectric layer, instead of conventional SiO2, the devices with an aligned NiO NW array exhibit a high hole mobility of 2.8 cm(2)/(V s) with a low operating voltage of 5 V, fast switching speed, and successful modulation of light emission over external light-emitting diodes. To the best of our knowledge, this is the first work demonstrating the low-voltage transistors based on p-type oxide NWs, which represents a great step toward the development of sensors and CMOS logic circuits.