期刊
NANO LETTERS
卷 17, 期 9, 页码 5452-5457出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b02099
关键词
CVD MoS2; grain boundaries; McWhorter; variable range hopping; low-frequency 1/f noise
类别
资金
- Department of Science and Technology, Government of India
- MURI ARO [W911NF-11-1-0362]
- FAME, a Semiconductor Research Corporation program - MARCO
- DARPA
- Air Force Office of Scientific Research (AFOSR) [FA9550-14-1-0268]
Despite its importance in the large-scale synthesis of transition metal dichalcogenides (TMDC) molecular layers, the generic quantum effects on electrical transport across individual grain boundaries (GBs) in TMDC monolayers remain unclear. Here we demonstrate that strong carrier localization due to the increased density of defects determines both temperature dependence of electrical transport and low-frequency noise at the GBs of chemical vapor deposition (CVD)-grown MoS2 layers. Using field effect devices designed to explore transport across individual GBs, we show that the localization length of electrons in the GB region is similar to 30-70% lower than that within the grain, even though the room temperature conductance across the GB, oriented perpendicular to the overall flow of current, may be lower or higher than the intragrain region. Remarkably, we find that the stronger localization is accompanied by nearly 5 orders of magnitude enhancement in the low-frequency noise at the GB region, which increases exponentially when the temperature is reduced. The microscopic framework of electrical transport and noise developed in this paper may be readily extended to other strongly localized two-dimensional systems, including other members of the TMDC family.
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