期刊
NANO LETTERS
卷 17, 期 8, 页码 4866-4872出版社
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b01727
关键词
ReaxFF; molecular dynamics simulations; MoO3 surface; sulfidation; MoS2; synthesis
类别
资金
- Computational Materials Sciences Program - U.S. Department of Energy, Office of Science, Basic Energy Sciences [DE-SC00014607]
- Grants-in-Aid for Scientific Research [16K05478, 16J05234] Funding Source: KAKEN
Transition metal dichalcogenides (TMDC) like MoS2 are promising candidates for next-generation electric and optoelectronic devices. These TMDC monolayers are typically synthesized by chemical vapor deposition (CVD). However, despite significant amount of empirical work on this CVD growth of monolayered crystals, neither experiment nor theory has been able to decipher mechanisms of selection rules for different growth scenarios, or make predictions of optimized environmental parameters and growth factors. Here, we present an atomic-scale mechanistic analysis of the initial sulfidation process on MoO3 surfaces using first-principles-informed ReaxFF reactive molecular dynamics (RMD) simulations. We identify a three-step reaction process associated with synthesis of the MoS2 samples from MoO3 and S-2 precursors: O-2 evolution and self-reduction of the MoO3 surface; SO/SO2 formation and S-2-assisted reduction; and sulfidation of the reduced surface and Mo-S bond formation. These atomic processes occurring during early stage MoS2 synthesis, which are consistent with experimental observations and existing theoretical literature, provide valuable input for guided rational synthesis of MoS2 and other TMDC crystals by the CVD process.
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