4.6 Article

Impedimetric Thiourea Sensing in Copper Electrorefining Bath based on DC Magnetron Sputtered Nanosilver as Highly Uniform Transducer

期刊

ELECTROCHIMICA ACTA
卷 184, 期 -, 页码 475-482

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2015.10.076

关键词

Nanostructured silver film; Thiourea sensing; DC magnetron sputtering; Impedimetric assessment; Copper electrorefining bath

资金

  1. Iranian Research Organization for Science and Technology (IROST)
  2. Iran Nanotechnology Initiative Council (INIC)
  3. Nano-structured Coating Co.

向作者/读者索取更多资源

Highly uniform sputtered nanostructured silver (Nano-Ag) film on the conductive carbon paper (CP) substrate (Nano-Ag/CP) was applied as a novel approach for thiourea (TU) measurement in copper electrorefining bath. Nano-Ag film was achieved by direct current (DC) magnetron sputtering system at the optimized instrumental deposition conditions. Characterization of the surface structure of Nano-Ag film by field emission-scanning electron microscopy (FE-SEM), exhibits uniform Nano-Ag film as an effective transducer for TU sensing. Step by step monitoring of Nano-Ag/CP electrode fabrication were performed using electrochemical methods such as cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) techniques. Fabricated Nano-Ag/CP electrode was used for TU determination using EIS assessment. The impedimetric results show high sensitivity for TU sensing within 2.0-250 ppm. (C) 2015 Elsevier Ltd. All rights reserved.

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