期刊
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
卷 8, 期 7, 页码 Q3154-Q3158出版社
ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0281907jss
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资金
- Department of the Defense, Defense Threat Reduction Agency [HDTRA1-17-1-011]
- American Society for Engineering Education
- Office of Naval Research
Valence and conduction band offsets of the InN/beta-Ga2O3 type-I heterojunction have been determined to be -0.55 +/- 0.11 eV and -3.35 +/- 0.11 eV, respectively, using X-ray photoelectron spectroscopy. The InN layers were grown using atomic layer epitaxy on (-201) oriented commercial beta-Ga2O3 substrates. Combining this data with published band offsets for the GaN and AlN heterojunctions to beta-Ga2O3 has allowed us to predict the band offsets for the AlGaN, AlInN, and InGaN ternary alloys to beta-Ga2O3. The conduction band offsets for InGaN and AlInN to beta-Ga2O3 increased for high In concentration and, similarly, the valence band offsets for AlGaN and AlInN to beta-Ga2O3 decreased at high Al concentration. (C) The Author(s) 2019. Published by ECS.
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