期刊
MATERIALS RESEARCH BULLETIN
卷 90, 期 -, 页码 253-259出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.materresbull.2017.03.010
关键词
Nanoimprinting lithography; TiO2 hard stamp; Sol-gel; Mechanical durability
资金
- National Natural Science Foundation of China [61622407, 61474128, 51672171, 21503261, 61504155]
- National Key Basic Research Program of China [2015CB921600]
- Eastern Scholar Program from the Shanghai Municipal Education Commission, the Science & Technology Commission of Shanghai Municipality [14JC1492900, 16DZ1207300]
- Youth Innovation Promotion Association, Chinese Academy of Sciences [2013302]
- Youth Innovation Fund for Interdisciplinary Research of SARI [Y426475234]
The fabrication of imprinting stamps plays a vital role in the nanoimprinting lithography. In this work, we proposed a facile method to fabricate TiO2 hard stamp by patterning sol-gel films. A polydimethysiloxane (PDMS) soft stamp with highly ordered micropit array was used as an original stamp to imprint the TiO2 sol which was spin coated on a quartz wafer. The nano-hardness and Young's modulus of TiO2 hard stamp are in the range of 7.7-10.0 GPa and 118.9-130.0 GPa, which is much higher than the conventional PDMS material. Afterwards the TiO2 hard stamps are demonstrated in both UV and hot embossing lithography with a promising life cycle. The proposed stamp can be extended to other metal oxides, which possesses a promising prospective for large scale patterning because of the low cost and excellent mechanical durability. (C) 2017 Elsevier Ltd. All rights reserved.
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