期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
卷 35, 期 1, 页码 -出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.4971196
关键词
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The authors present a new method to determine film thicknesses and sticking coefficients (SC) of precursor molecules for atomic layer deposition (ALD) in high aspect ratio three dimensional (3D) geometries as they appear in microelectromechanical system manufacturing. The method combines a specifically designed experimental test structure with the theoretical predictions from a novel 3D Monte Carlo process simulation for large structures. The authors exemplify our method using Al2O3 and SiO2 ALD processes. SCs for trimethylaluminium and bis-diethyl aminosilane (BDEAS) are extracted. The SC for BDEAS is determined for the first time. (C) 2016 American Vacuum Society.
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