4.4 Article

Communication-Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching

期刊

出版社

ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0311906jss

关键词

-

资金

  1. Intramural NIST DOC [9999-NIST] Funding Source: Medline

向作者/读者索取更多资源

A practical nanofabrication process is detailed for the generation of black GaAs. Discontinuous films of Au nanoparticles are electrodeposited onto GaAs substrates to catalyze site-specific etching in a solution consisting of KMnO4 and HF via the metal-assisted chemical etching. This provides a solution-based and lithography-free method for fabricating sub-wavelength nanostructure arrays that exhibit solar-weighted reflectance approaching 4%. This two-step benchtop process can be performed at room-temperature without lithography, vacuum instrumentation, or epitaxy, providing a high-throughput nanotexturing approach for photovoltaics applications. (c) 2019 The Electrochemical Society.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据