4.7 Article

Single-Source Vapor Deposition of Quantum-Cutting Yb3+:CsPb(Cl1-xBrx)3 and Other Complex Metal-Halide Perovskites

期刊

ACS APPLIED ENERGY MATERIALS
卷 2, 期 6, 页码 4560-4565

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsaem.9b00910

关键词

single-source vapor deposition; metal-halide perovskite; quantum cutting; mechanochemistry; scalable processing; solar

资金

  1. National Science Foundation (NSF) [DMR-1807394]
  2. UW Molecular Engineering Materials Center, a Materials Research Science and Engineering Center [DMR-1719797]
  3. State of Washington through the UW Clean Energy Institute via the Washington Research Foundation
  4. NSF [ECC-1542101]
  5. University of Washington
  6. Molecular Engineering and Sciences Institute
  7. National Institutes of Health

向作者/读者索取更多资源

Metal-halide semiconductors exhibit attractive properties for a host of applications including photovoltaics, solid-state lighting, and photodetection. Among the remarkable recent developments is the discovery of extraordinarily high photoluminescence quantum yields in Yb3+-doped inorganic lead-halide perovskites. Although all previous research and development of such quantum-cutting materials has involved solution-phase preparation, particularly as colloidal nanocrystals, such methods can introduce both processing and technical challenges that limit the scope of accessible compositions, morphologies, and scaled-up applications. Here, we demonstrate a scalable single-source vapor deposition (SSVD) method for depositing high quality conformal thin films of complex metal-halide perovskites, including doped perovskites, over large areas at high deposition rates. Focusing on quantum-cutting Yb3+:CsPb(Cl1-xBrx)(3), we demonstrate large-area deposition of films with photoluminescence quantum yields as high as 183%, starting from single-source powders prepared mechanochemically from solid ionic precursors. We also prepare thin films of the solar absorber material (FA(0.81)MA(0.14)Cs(0.05))Pb(Cl0.02Br0.14I0.84)(3) to illustrate the generality of this SSVD method. These results demonstrate a promising approach to high-throughput vapor processing of metal-halide coatings for photonic and optoelectronic applications.

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