Magnetic Properties and Coercivity of MnGa Films Deposited on Different Substrates

MnGa films were grown by magnetron sputtering on thermally oxidized Si (Si/SiO2) and glass substrates. Films grown on single-crystal Si (100) substrate with different underlayers were prepared for comparison. It is found that the Si/SiO2 substrate is more suitable for growing high-coercivity MnGa films than the glass substrate, which is the result of the isolated-island-like growth. A coercivity of 9.7 kOe can be achieved for the 10 nm MnGa films grown on Si/SiO2 substrate at substrate temperature TS of 450 degrees C. Optimized experimental conditions are specified by changing the thickness of the MnGa films and the temperature of the substrates. Copyright (C) 2017, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited.