4.7 Article

Sensors based on mesoporous SnO2-CuWO4 with high selective sensitivity to H2S at low operating temperature

期刊

JOURNAL OF HAZARDOUS MATERIALS
卷 331, 期 -, 页码 150-160

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jhazmat.2017.02.038

关键词

Mesoporous SnO2-CuWO4; Intrinsic properties; H2S selective sensitivity; Low operating temperature; Controlled temperature trigger

资金

  1. Romanian National Authority for Scientific Research through the Core Program [PN16480102/2016]
  2. Competitiveness Operational Programme [54/2016]
  3. Partnerships in priority S&T domains Program (PNII)
  4. MEN-UEFISCDI [56/2014]

向作者/读者索取更多资源

Development of new sensitive materials by different synthesis routes in order to emphasize the sensing properties for hazardous H2S detection is one of a nowadays challenge in the field of gas sensors. In this study we obtained mesoporous SnO2-CuWO4 with selective sensitivity to H2S by an inexpensive synthesis route with low environmental pollution level, using tripropylamine (TPA) as template and polyvinylpyrrolidone (PVP) as dispersant/stabilizer. In order to bring insights about the intrinsic properties, the powders were characterized by means of a variety of complementary techniques such as: X-Ray Diffraction, XRD; Transmission Electron Microscopy, TEM; High Resolution TEM, HRTEM; Raman Spectroscopy, RS; Porosity Analysis by N-2 adsorption/desorption, BET; Scanning Electron Microscopy, SEM and X-ray Photoelectron Spectroscopy, XPS. The sensors were fabricated by powders deposition via screen printing technique onto planar commercial Al2O3 substrates. The sensor signals towards H2S exposure at low operating temperature (100 degrees C) reaches values from 10(5) (for SnWCu600) to 10(6) (for SnWCu800) over the full range of concentrations (5-30 ppm). The recovery processes were induced by a short temperature trigger of 500 degrees C. The selective sensitivity was underlined with respect to the H2S, relative to other potential pollutants and relative humidity (10-70% RH). (C) 2017 Elsevier B.V. All rights reserved.

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