4.7 Article

Abatement and toxicity reduction of antimicrobials by UV/H2O2 process

期刊

JOURNAL OF ENVIRONMENTAL MANAGEMENT
卷 193, 期 -, 页码 439-447

出版社

ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.jenvman.2017.02.028

关键词

Advanced oxidation process; Antimicrobial activity; Ofloxacin; Peroxidation; Photolysis; Sulfaquinoxaline

资金

  1. CAPES
  2. CNPq [479131/2013-9]
  3. FAPESP [2013/04656-8, 2013/09543-7]
  4. M.G. Maniero [2013/07817-2]

向作者/读者索取更多资源

Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H2O2) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time. (C) 2017 Elsevier Ltd. All rights reserved.

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