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Calculation of the surface binding energy for ion sputtered particles
Y Kudriavtsev et al.
APPLIED SURFACE SCIENCE (2005)
The industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating
KE Cooke et al.
SURFACE & COATINGS TECHNOLOGY (2004)
Modelling of cluster emission from metal surfaces under ion impact
G Betz et al.
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES (2004)
Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation
D Güttler et al.
APPLIED PHYSICS LETTERS (2004)
Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation
D Depla et al.
SURFACE & COATINGS TECHNOLOGY (2004)
Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering
D Depla et al.
SURFACE & COATINGS TECHNOLOGY (2004)
A cross-corner effect in a rectangular sputtering magnetron
QH Fan et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2003)
High power pulsed magnetron sputtered CrNx films
AP Ehiasarian et al.
SURFACE & COATINGS TECHNOLOGY (2003)
Characterisation parameters for unbalanced magnetron sputtering systems
IV Svadkovski et al.
VACUUM (2002)
Measurement of the plasma potential in a magnetron discharge and the prediction of the electron drift speeds
JW Bradley et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2001)
Surface processes and diffusion mechanisms of ion nitriding of stainless steel and aluminium
W Möller et al.
SURFACE & COATINGS TECHNOLOGY (2001)
Wear associated with growth defects in combined cathodic arc/unbalanced magnetron sputtered CrN/NbN superlattice coatings during erosion in alkaline slurry
HW Wang et al.
SURFACE & COATINGS TECHNOLOGY (2000)
Electron emission from clean gold bombarded by slow Auq+ (q=1-3) ions
H Eder et al.
JOURNAL OF APPLIED PHYSICS (2000)
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