相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Hydrogen atom density in narrow-gap microwave hydrogen plasma determined by calorimetry
Takahiro Yamada et al.
JOURNAL OF APPLIED PHYSICS (2016)
Spectroscopic analysis of H2/CH4 microwave plasma and fast growth rate of diamond single crystal
N. Derkaoui et al.
JOURNAL OF APPLIED PHYSICS (2014)
Determining electron temperature and electron density in moderate pressure H2/CH4 microwave plasma
N. Derkaoui et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2014)
Atmospheric-pressure low-temperature plasma processes for thin film deposition
Hiroaki Kakiuchi et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2014)
Purified Silicon Film Formation from Metallurgical-Grade Silicon by Hydrogen-Plasma-Induced Chemical Transport
Hiromasa Ohmi et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2013)
Quantitative analysis of diamond deposition reactor efficiency
A. Gicquel et al.
CHEMICAL PHYSICS (2012)
Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
Francoise Massines et al.
PLASMA PROCESSES AND POLYMERS (2012)
Atmospheric plasmas for thin film deposition: A critical review
Delphine Merche et al.
THIN SOLID FILMS (2012)
Nonequilibrium Atmospheric Plasma Deposition
T. Belmonte et al.
JOURNAL OF THERMAL SPRAY TECHNOLOGY (2011)
Status and potential of atmospheric plasma processing of materials
Daphne Pappas
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2011)
Modelling of diamond deposition microwave cavity generated plasmas
K. Hassouni et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2010)
Hydrogen atom density in a solar plasma reactor
Alenka Vesel et al.
VACUUM (2010)
Purified Si film formation from metallurgical-grade Si by hydrogen plasma induced chemical transport
Hiromasa Ohmi et al.
APPLIED PHYSICS LETTERS (2009)
Measurement of electron density in atmospheric pressure small-scale plasmas using CO2-laser heterodyne interferometry
Joon-Young Choi et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2009)
Cross Sections for Electron Collisions with Hydrogen Molecules
Jung-Sik Yoon et al.
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA (2008)
Hydrogen plasma diagnosis in penning ion source by optical emission spectroscopy
Da-Zhi Jin et al.
VACUUM (2008)
A Stark broadening method to determine simultaneously the electron temperature and density in high-pressure microwave plasmas
J. Torres et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2007)
Impedance matching for an asymmetric dielectric barrier discharge plasma actuator
Kunwar Pal Singh et al.
APPLIED PHYSICS LETTERS (2007)
Gas temperature and surface heating in plasma enhanced chemical-vapour-deposition
Shota Nunomura et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2006)
Wafer-voltage measurement in plasma processes by means of a new probe method and an impedance monitor
S Kanno et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2004)
Optical diagnostics of atmospheric pressure air plasmas
CO Laux et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2003)
End-point detection of reactive ion etching by plasma impedance monitoring
M Kanoh et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS (2001)
Cross section data for electron-impact inelastic processes of vibrationally excited molecules of hydrogen and its isotopes
R Celiberto et al.
ATOMIC DATA AND NUCLEAR DATA TABLES (2001)
Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature
VM Donnelly et al.
APPLIED PHYSICS LETTERS (2000)
Electron density measurements in an atmospheric pressure air plasma by means of infrared heterodyne interferometry
F Leipold et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2000)