4.7 Article

Defect-modified reduced graphitic carbon nitride (RCN) enhanced oxidation performance for photocatalytic degradation of diclofenac

期刊

CHEMOSPHERE
卷 258, 期 -, 页码 -

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.chemosphere.2020.127343

关键词

Reduced graphitic carbon nitride; Nitrogen vacancies; Hydroxyl radicals; Photocatalytic; Diclofenac

资金

  1. National Natural Science Foundation of China [21677040]
  2. Guangzhou Municipal Science and Technology Project [201903010080]
  3. China Post-doctoral Science Foundation [2019T120102]
  4. National Science Foundation for Young Scientists of China [21906029]

向作者/读者索取更多资源

Hydroxyl radicals (center dot OH) have robust non-selective oxidizing properties to effectively degrade organic pollutants. However, graphitic carbon nitride (g-C3N4) is restricted to directly generate center dot OH due to its intrinsic valence band. In this study, we report a facile environmental-friendly self-modification strategy to synthesize reduced graphitic carbon nitride (RCN), with nitrogen vacancies and C N functional groups. The incorporation of C N enabled to downshift the valence band level, which endowed RCN with the capacity to directly generate center dot OH via h(+). Experimental and instrumental analyses revealed the critical roles of nitrogen vacancies and C N groups in the modification of the RCN band structure to improve its visible light absorption and oxidizing capacity. With these superior properties, the RCN was significantly enhanced for the photocatalytic degradation of DCF under visible light irradiation. The self-modification strategy articulated in this study has strong potential for the creation of customized g-C3N4 band structures with enhanced oxidation performance. (C) 2020 Elsevier Ltd. All rights reserved.

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