4.6 Article

UiO-66 type metal-organic framework as a multifunctional additive to enhance the interfacial stability of Ni-rich layered cathode material

期刊

JOURNAL OF ENERGY CHEMISTRY
卷 50, 期 -, 页码 378-386

出版社

ELSEVIER
DOI: 10.1016/j.jechem.2020.03.049

关键词

Ni-rich layered cathode; Metal-organic framework additive; Electrolyte corrosion; Transition metal dissolution; Interfacial stability

资金

  1. National Key R&D Program of China [2016YFB0100301]
  2. National Natural Science Foundation of China [21875022, 51802020, U1664255]
  3. Beijing Institute of Technology Research Fund Program for Young Scholars
  4. Young Elite Scientists Sponsorship Program by CAST [2018QNRC001]

向作者/读者索取更多资源

To effectively alleviate the surface structure degradation caused by electrolyte corrosion and transition metal (TM) dissolution for Ni-rich (Ni content > 0.6) cathode materials, porous Zirconium based metal organic frameworks (Zr-MOFs, UiO-66) material is utilized herein as a positive electrode additive. UiO-66 owns tunable attachment sites and strong binding affinity, making itself an efficient defluorination agent to suppress the undesirable reactions caused by fluorine species. Besides, it can also relieve TMs dissolution and block the migration of TMs toward anode side since it's a multifarious metal ions adsorbent, realizing both cathode and anode interface protection. Benefiting from these advantages, the UiO-66 assistant Ni-rich cathode achieves superior cycling stability. Particularly in full cell, the positive effects of this multifunctional additive are more pronounced than in the half-cell, that is after 400 cycles at 2 C, the capacity retention has doubled with the addition of UiO-66. More broadly, this unique application of functional additive provides new insight into the degradation mechanism of layered cathode materials and offers a new avenue to develop high-energy density batteries. (c) 2020 Science Press and Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. and Science Press. All rights reserved.

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