期刊
NANOSCALE
卷 12, 期 39, 页码 20404-20412出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/d0nr03863f
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- China Scholarship Council (CSC) - Deutsche Forschungsgemeinschaft (DFG) [PI 762/11-1, 182087777 - SFB 951]
Two-dimensional (2D) transition metal dichalcogenides (TMDs) such as MoS(2)are materials for multifarious applications such as sensing, catalysis, and energy storage. Due to their peculiar charge-transport properties, it is always desired to control their morphologies from vertical nanostructures to horizontal basal-plane oriented smooth layers. In this work, we established a low-temperature ALD process for MoS(2)deposition using bis(t-butylimino)bis(dimethylamino)molybdenum(vi) and H2S precursors. The ALD reaction parameters, including reaction temperature and precursor pulse times, are systematically investigated and optimized. Polycrystalline MoS(2)is conformally deposited on carbon nanotubes, Si-wafers, and glass substrates. Moreover, the morphologies of the deposited MoS(2)films are tuned from smooth film to vertically grown flakes, and to nano-dots, by controlling the reaction parameters/conditions. It is noticed that our MoS(2)nanostructures showed morphology-dependent optical and electrocatalytic properties, allowing us to choose the required morphology for a targeted application.
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