期刊
CHEMICAL ENGINEERING JOURNAL
卷 400, 期 -, 页码 -出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.cej.2020.125902
关键词
Graphitic carbon nitride; Inverse opal; Doping; Antibiotic degradation; Antimicrobial activity
资金
- National Natural Science Foundation of China [21777044, 5171101651, 21677048, 21811540394]
- National Key Research and Development Program [2016YFA0204200]
- National Water Pollution Control and Treatment Science and Technology Major Project [2017ZX07207002]
- Science and Technology Commission of Shanghai Municipality [17520711500, 19ZR1472400, 19230711300]
- Fundamental Research Funds for the Central Universities [222201714061, 222201915012, 222201818014]
The efficient degradation of fluoroquinolone antibiotics and the reduction of their antimicrobial activity were achieved in different water matrices through the photocatalysis of inverse opal potassium-doped carbon nitride (IO K-CN). The IO K-CN photocatalyst with optimum doping ratio of potassium performed much better than bulk carbon nitride and pure inverse opal carbon nitride for removing fluoroquinolone antibiotics, such as levo-floxacin (LVX) and norfloxacin (NOR). The remarkably narrowed band gap resulting from potassium doping and the unique properties of the inverse opal construction jointly contributed to enhancing the activity of the photocatalyst. A possible mechanism and degradation pathway for LVX was proposed on the basis of a series of characterizations including electron spin resonance (ESR) experiments, and liquid chromatography-mass spectrometry (LC-MS) analysis. Meanwhile, the byproducts during the LVX photocatalytic degradation were shown to have much lower sterilization effect, implying that the toxicity and the potential risk of LVX were excellently reduced. The potential application for the treatment of antibiotic-containing wastewater was indicated by the excellent treatment efficiency and favorable durability of this photocatalyst.
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