期刊
OPTICAL AND QUANTUM ELECTRONICS
卷 52, 期 11, 页码 -出版社
SPRINGER
DOI: 10.1007/s11082-020-02584-2
关键词
Gold nano particles; TiO2 thin films; Multifractal analysis; Stereometric analysis; Atomic force microscopy
This work describes the morphology of titanium oxide (TiO2) thin films deposited by gold nanoparticles and produced at room temperature over Si(100) wafers. A direct-current (DC) reactive magnetron sputtering process was applied for the sample preparation. Then, their three-dimensional (3-D) surface characterization was carried out by using atomic force microscopy (AFM). Stereometric analysis was carrying out on the basis of AFM-data, and the surface topography was described according to ISO 25,178-2:2012 standard. As can be seen, the surface of sample #3 has the most regular topography (Df = 2.70 +/- 0.01) with the most regular surface (Sq = 0.97 nm). The most irregular topography (Df = 2.83 +/- 0.01) was found in sample #2, while the most irregular surface (Sq = 3.38 nm) was found in sample #1.
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