4.6 Article

Offset Drain ZnO Thin-Film Transistors for High-Voltage Operation

期刊

IEEE ELECTRON DEVICE LETTERS
卷 38, 期 8, 页码 1047-1050

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2017.2721953

关键词

High voltage thin film transistors (HV TFTs); offset drain TFTs; zinc oxide; ZnO; PEALD; oxide TFTs

资金

  1. The Dow Company
  2. NASA

向作者/读者索取更多资源

High-voltage thin-film transistors (TFTs) are useful building blocks for thin-film circuits. In this letter, we demonstrate ZnO high-voltage TFTs with offset drain. For these devices, the drain-to-source breakdown voltage increases from about 30 to >80 V as the drain offset length is increased from 0 to similar to 2 mu m, with little degradation in the I-V characteristics. The fabrication process is simple and uses a maximum temperature of 200 degrees C, which allows the high-voltage ZnO TFTs to be readily integrated in thin-film circuits on either glass or polymeric substrates.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据