期刊
IEEE ELECTRON DEVICE LETTERS
卷 38, 期 11, 页码 1555-1558出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2017.2751571
关键词
Superjunction; T-SJ LDMOS; breakdown voltage (V-B); specific on-resistance (R-on,R- sp); thin layer SOI
资金
- National Natural Science Foundation of China [61704020, 61376080, 61474017]
- 13th Five-Year Plan for Microelectronics Advanced Research Program [31513030201-2]
- Fundamental Research Funds for the Central Universities [ZYGX2017KYQD159]
A novel superjunction (SJ) lateral double-diffused MOSFET (> 950 V) with a thin layer SOI combining the advantage of low specific on-resistance R-on, (sp) of the SJ and the high breakdown voltage V-B of the thin SOI is proposed and experimentally demonstrated in this letter. Based on our previously developed equivalent substrate model, the optimized SJ endows the device with a respectably reduced R-on,R- sp without sacrificing V-B. Meanwhile, the thin layer SOI is designed with the enhanced dielectric layer field principle to carry out a high V-B. The experimental results exhibit a R-on,R- sp of 145 m Omega.cm(2) with a V-B of 977 V. This represents a reduction in R-on,R- sp by 18.1% when compared with the theoretical R-on,R- sp alpha V-B(2.5) silicon limit.
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