期刊
PROCEEDINGS OF THE 2020 3RD IEEE INTERNATIONAL CONFERENCE ON DIELECTRICS (ICD 2020)
卷 -, 期 -, 页码 205-208出版社
IEEE
DOI: 10.1109/ICD46958.2020.9341862
关键词
-
资金
- program IDEX Actions Thematiques Strategiques - ATS 2015 of the Universite de Toulouse under project SEPHIR [2016-066-CIF-D-DRVD]
- UMS Raymond Castaing of Universite de Toulouse
Interface properties of dielectrics are of outmost importance when dealing with phenomena as charge injection or secondary electron emission. When the dielectric thickness scales down to the nm range, a deviation from the bulk material properties occurs; therefore, a possibility to tune the surface properties comes by modifying dielectrics at its sub-surface. This paper focuses on the precision of plasma-based processes in order to elaborate thin silica dielectric layers with a single plane of silver nanoparticles (AgNPs) at its sub-surface and thus to control their behavior under electrical stress. An illustration of the modulated properties of such nanostructured dielectrics is given through current measurements and electron emission.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据