4.8 Article

Observation of single-defect memristor in an MoS2 atomic sheet

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NATURE NANOTECHNOLOGY
卷 16, 期 1, 页码 58-62

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NATURE PORTFOLIO
DOI: 10.1038/s41565-020-00789-w

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资金

  1. Presidential Early Career Award for Scientists and Engineers (PECASE) through the Army Research Office [W911NF-16-1-0277]
  2. National Science Foundation [ECCS-1809017]
  3. US SAMP
  4. T Cooperation Program
  5. EPSRC [EP/N025938/1] Funding Source: UKRI

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Non-volatile resistive switching, also known as memristor effect, has emerged as an important concept in high-density information storage, computing, and reconfigurable systems. Recent discoveries in two-dimensional monolayers have refuted previous beliefs and added a new dimension to materials science.
Non-volatile resistive switching, also known as memristor(1) effect, where an electric field switches the resistance states of a two-terminal device, has emerged as an important concept in the development of high-density information storage, computing and reconfigurable systems(2-9). The past decade has witnessed substantial advances in non-volatile resistive switching materials such as metal oxides and solid electrolytes. It was long believed that leakage currents would prevent the observation of this phenomenon for nanometre-thin insulating layers. However, the recent discovery of non-volatile resistive switching in two-dimensional monolayers of transition metal dichalcogenide(10,11) and hexagonal boron nitride(12) sandwich structures (also known as atomristors) has refuted this belief and added a new materials dimension owing to the benefits of size scaling(10,13). Here we elucidate the origin of the switching mechanism in atomic sheets using monolayer MoS2 as a model system. Atomistic imaging and spectroscopy reveal that metal substitution into a sulfur vacancy results in a non-volatile change in the resistance, which is corroborated by computational studies of defect structures and electronic states. These findings provide an atomistic understanding of non-volatile switching and open a new direction in precision defect engineering, down to a single defect, towards achieving the smallest memristor for applications in ultra-dense memory, neuromorphic computing and radio-frequency communication systems(2,3,11). A combination of atomistic imaging and spectroscopy reveals that metal substitution into a sulfur vacancy is the underlying mechanism for resistive switching in transition metal dichalcogenide monolayers.

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