Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry

Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here, we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms. This tabletop microscope can nondestructively probe surface topography, layer thicknesses, and interface quality, as well as dopant concentrations and profiles. High-fidelity imaging was achieved by implementing variable-angle ptychographic imaging, by using total variation regularization to mitigate noise and artifacts in the reconstructed image, and by using a high-brightness, high-harmonic source with excellent intensity and wavefront stability. We validate our measurements through multiscale, multimodal imaging to show that this technique has unique advantages compared with other techniques based on electron and scanning probe microscopies.

Automated summary

This technique combines the excellent phase stability of high-harmonic sources, the unique chemical sensitivity of extreme ultraviolet reflectometry, and advanced ptychography imaging algorithms to achieve high-fidelity imaging of nano- and quantum devices. It can nondestructively probe surface topography, layer thicknesses, interface quality, dopant concentrations, and profiles. The measurements are validated through multiscale, multimodal imaging, showing unique advantages compared with other techniques based on electron and scanning probe microscopies.