Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

Here, we report on a simultaneous growth and radical-initiated cross-linking of a hybrid thin film in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited a self-limiting MLD growth behavior and improved properties like 12% higher film density and enhanced stability compared to the non-cross-linked film.

Automated summary

This study presents a simultaneous growth and radical-initiated cross-linking of a hybrid thin film using molecular layer deposition (MLD) in a layer-by-layer manner. The cross-linked film demonstrates a self-limiting MLD growth behavior, as well as improved properties such as higher film density and enhanced stability compared to non-cross-linked films.