4.6 Article

Band Alignment and Enhanced Interfacial Conductivity Manipulated by Polarization in a Surfactant-Mediated Grown κ-Ga2O3/In2O3 Heterostructure

期刊

ACS APPLIED ELECTRONIC MATERIALS
卷 3, 期 2, 页码 795-803

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsaelm.0c00947

关键词

wide-bandgap oxides; laser molecular beam epitaxy; polarization engineering; band electronic structures; two-dimensional electron gas

资金

  1. National Key R&D Program of China [2018YFB0406502]
  2. National Nature Science Foundation of China [61774081, 91850112]
  3. State Key R&D project of Jiangsu [BE2018115, BE2019103]
  4. State Key R&D project of Guangdong [2020B010174002]
  5. Shenzhen Fundamental Research Project [JCYJ20170818110619334, JCYJ20180307154632609, JCYJ20180307163240991]

向作者/读者索取更多资源

This study successfully constructed the heterostructure of single crystalline metastable orthorhombic kappa-Ga2O3 epilayers and cubic In2O3 (111) using laser molecular beam epitaxy. Analysis of XPS and Hall results revealed the formation of a two-dimensional electron gas at the heterostructure interface with high carrier concentration and mobility.
Integration of intriguing ferroelectric kappa-Ga2O3 on other oxide semiconductors opens an exciting avenue to invoke emergent transport phenomena and enable rational design of advanced device architectures, whereas the fundamental growth dynamics and physical properties of metastable kappa-Ga2O3, are still far unexplored. In this work, we report on the heterostructure construction of single crystalline metastable orthorhombic kappa-Ga2O3 epilayers and cubic In2O3 (111) by means of laser molecular beam epitaxy. Elements of Sn and In are found to segregate to the growth surface and serve as surfactants to reduce the total surface energy and diffusion barrier of oxygen adatoms, hence producing Ga-rich conditions on the growth front, which in turn facilitates the stabilization of kappa-phase Ga2O3. Depth-profiled X-ray photoemission spectral (XPS) analysis identified a type-I band alignment with a conduction band offset (CBO) of 0.45 eV and a valence band offset (VBO) of -1.15 eV for a kappa-Ga2O3/In2O3 heterostructure. Determined by the analysis of Hall results with a double-layer model, a two-dimensional electron gas (2DEG) with a sheet carrier concentration of 1.2 X 10(14) cm(-2) and an enhanced mobility of 192 cm(2)/(V s) is confined at the heterostructure interface. The self-consistent Poisson-Schrodinger calculations indicate that the enhanced interfacial conductivity is a result of the combination of polarization manipulation and band discontinuity, well-supported by the characteristics of piezoelectric force microscopy and depth-profiled XPS. Integrating kappa-Ga2O3 on other hexagonal polar semiconductors may open a possibility to manipulate the interfacial conductivity through polarization engineering and deliver advanced devices with multiple functionalities.

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