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Direct writing of optical waveguides in fused silica by the fundamental beam of an Yb:KGW femtosecond laser

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OSA CONTINUUM
卷 4, 期 3, 页码 1000-1009

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OPTICAL SOC AMER
DOI: 10.1364/OSAC.399426

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  1. Hitachi
  2. Japan Science and Technology Agency

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This study demonstrates the fabrication of an optical waveguide with propagation loss below 1 dB/cm using an Yb:KGW femtosecond laser in fused silica. By controlling pulse energy and duration, the propagation loss achieved is comparable to that of a waveguide made using a Ti:Sapphire laser. It is also shown that nano-wrinkles and nano-pores, which cause losses, can be avoided in modified silica under certain conditions.
We report the fabrication of an optical waveguide with a propagation loss below 1 dB/cm in fused silica using the fundamental beam of an Yb:KGW femtosecond laser. By selecting the pulse energy and pulse duration, we obtained a propagation loss comparable with that of a waveguide made using a Ti:Sapphire laser. We demonstrate that the nano-wrinkles and nano-pores, which dominate the losses, are not formed in the modified silica if the pulse energy is below 0.80 mu J and the pulses are shorter than 300 fs. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

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