Gradual resistive switching and synaptic properties of ITO/HfAlO/ITO device embedded with Pt nanoparticles

ITO/HfAlO/Pt-NP/HfAlO/ITO RRAM device was fabricated with atomic layer deposited Pt-NPs. Controlled filament formation and multilevel conductance was observed due to enhancing local electric field near Pt-NPs. Resistive switching properties with ON/OFF ratio of > 10 and good endurance upto 500 cycles were achieved. Potentiation/depression characteristics were successfully demonstrated by applying increasing positive/negative voltage pulses. Gradual change in conductance was implemented for demonstration of spike-timing-dependent plasticity (STDP) learning which shows that the proposed RRAM device can be the possible candidate for electronic synaptic devices. (c) 2021 Elsevier B.V. All rights reserved.

Automated summary

A RRAM device was fabricated using Pt-NPs deposited by atomic layer deposition, showing controlled filament formation and multilevel conductance, achieving excellent resistive switching properties. Potentiation/depression characteristics were successfully demonstrated by applying increasing voltage pulses, indicating the device's learning potential.