期刊
CHINESE OPTICS LETTERS
卷 19, 期 6, 页码 -出版社
OSA-OPTICAL SOC
DOI: 10.3788/COL202119.060017
关键词
Si thin film; lithium niobate thin film; hybrid material; integrated optics
类别
资金
- National Key RAMP
- D Program of China [2019YFA0705000, 2018YFB2201700]
By combining the advantages of silicon's excellent electronics properties and mature micro-processing technology with the excellent optical properties of lithium niobate, a potentially promising material platform for photonic integrated circuits has been created. A 3-inch wafer-scale hybrid mono-crystalline Si/LN thin film was successfully fabricated using ion-implantation and wafer-bonding technologies. Characterization techniques such as high-resolution transmission electron microscopy, secondary-ion mass spectroscopy, X-ray diffraction, and Raman measurements were used to investigate the crystal-lattice arrangement, H-atom-concentration distribution, and lattice properties of the Si/LN thin films. The optical propagation loss of Si strip-loaded straight waveguides at 1550 nm was found to be 6 dB/cm for the quasi-TE mode. The characterization results provide valuable information about this hybrid material platform.
The heterogeneous integration of silicon thin film and lithium niobate (LN) thin film combines both the advantages of the excellent electronics properties and mature micro-processing technology of Si and the excellent optical properties of LN, comprising a potentially promising material platform for photonic integrated circuits. Based on ion-implantation and wafer-bonding technologies, a 3 inch wafer-scale hybrid mono-crystalline Si/LN thin film was fabricated. A high-resolution transmission electron microscope was used to investigate the crystal-lattice arrangement of each layer and the interfaces. Only the H-atom-concentration distribution was investigated using secondary-ion mass spectroscopy. Highresolution X-ray-diffraction omega-2 theta scanning was used to study the lattice properties of the Si/LN thin films. Raman measurements were performed to investigate the bulk Si and the Si thin films. Si strip-loaded straight waveguides were fabricated, and the optical propagation loss of a 5-mu m-width waveguide was 6 dB/cm for the quasi-TE mode at 1550 nm. The characterization results provide useful information regarding this hybrid material.
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