期刊
出版社
IEEE
DOI: 10.1109/MEMS51782.2021.9375344
关键词
focused ion beam; bitmap milling; gray scale value; general formula of error
资金
- National key research and development program of China [number2018YFB2002600]
- National Natural Science Foundation of China [51875104]
This paper presents a method for accurately determining the gray scale value of the bitmap and applies it to the production of modified bitmaps. Experimental results show that this method can significantly improve the shape accuracy of microstructures.
In focused ion beam (FIB) sputtering etching process, bitmap file is often used to store the dwell time and location information of ion beam. This paper presents a method for determining the gray scale value of the bitmap accurately. In this method, the variation of sputter yield and the curve form of the microstructures are taken into consideration. The proposed general formula can effectively compensate the error in the desired microstructures. This method is further applied to the production of modified bitmaps. Experimental results show that the shape accuracy of microstructures can be improved obviously.
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