期刊
出版社
IEEE
DOI: 10.1109/ICREGA50506.2021.9388287
关键词
NW; porous; silicon; FiTC; Silica; nanoparticles
Porous silicon nanowires (PSiNWs) doped with FiTC-doped silica were successfully produced using a simple and cost-effective chemical etching method, showing silicon nanoparticles ranging from 30-60 nm. The UV-Vis spectra exhibited three characteristic peaks, and the nanoparticles prepared at different temperatures exhibited different PL dependencies. Increasing the immersion time led to higher emission of the fabricated nanocomposite, indicating the potential applications of doped PSiNWs in optoelectronics.
We report the structural and optical properties of porous silicon nanowires (PSiNWs) with FiTC-doped silica produced by a simple cost-effective chemical etching method. Silicon nanoparticles with size range from 30-60 nm have been observed from the FiTC-doped silica. The UV-Vis spectra exhibited three characteristic peaks. The nanoparticles prepared at different temperature showed a PL dependence. Increasing the immersion time will increase the emission of the fabricated nanocomposite. The doped PSiNWs fabricated using the electroless etching method can find potential applications in optoelectronics.
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