相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Kinetically stabilized ferroelectricity in bulk single-crystalline HfO2:Y
Xianghan Xu et al.
NATURE MATERIALS (2021)
Electric-Field-Induced Ferroelectricity in 5%Y-doped Hf0.5Zr0.5O2: Transformation from the Paraelectric Tetragonal Phase to the Ferroelectric Orthorhombic Phase
Takao Shimizu et al.
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS (2021)
Large thermal hysteresis of ferroelectric transition in HfO2-based ferroelectric films
Takanori Mimura et al.
APPLIED PHYSICS LETTERS (2021)
Phase-Exchange-Driven Wake-Up and Fatigue in Ferroelectric Hafnium Zirconium Oxide Films
Shelby S. Fields et al.
ACS APPLIED MATERIALS & INTERFACES (2020)
Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction
Maximilian Lederer et al.
NANOMATERIALS (2020)
Strain effect on the stability in ferroelectric HfO2 simulated by first-principles calculations
Sheng-Ting Fan et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2020)
Wake-Up Mechanisms in Ferroelectric Lanthanum-Doped Hf0.5Zr0.5O2Thin Films
Furqan Mehmood et al.
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2020)
A first-principles study on ferroelectric phase formation of Si-doped HfO2 through nucleation and phase transition in thermal process
Jixuan Wu et al.
APPLIED PHYSICS LETTERS (2020)
Effects of heat treatment and in situ high-temperature X-ray diffraction study on the formation of ferroelectric epitaxial Y-doped HfO2 film
Takanori Mimura et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2019)
Phase transformation behavior of ultrathin Hf0.5Zr0.5O2 films investigated through wide range annealing experiments
Shinji Migita et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2019)
Effects of growth orientations and epitaxial strains on phase stability of HfO2 thin films
Shi Liu et al.
PHYSICAL REVIEW MATERIALS (2019)
Local crystallographic phase detection and texture mapping in ferroelectric Zr doped HfO2 films by transmission-EBSD
M. Lederer et al.
APPLIED PHYSICS LETTERS (2019)
Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides
Min Hyuk Park et al.
ADVANCED ELECTRONIC MATERIALS (2019)
Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
Uwe Schroeder et al.
INORGANIC CHEMISTRY (2018)
Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study
Robin Materlik et al.
JOURNAL OF APPLIED PHYSICS (2018)
Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO2
Everett D. Grimley et al.
ADVANCED MATERIALS INTERFACES (2018)
Thickness-dependent crystal structure and electric properties of epitaxial ferroelectric Y2O3-HfO2 films
Takanori Mimura et al.
APPLIED PHYSICS LETTERS (2018)
Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films
Min Hyuk Park et al.
NANOSCALE (2018)
Ferroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin films
Takao Shimizu et al.
APPLIED PHYSICS LETTERS (2018)
Thermodynamic control of ferroelectric-phase formation in HfxZr1-xO2 and ZrO2
Shigehisa Shibayama et al.
JOURNAL OF APPLIED PHYSICS (2018)
Impact of Four-Valent Doping on the Crystallographic Phase Formation for Ferroelectric HfO2 from First-Principles: Implications for Ferroelectric Memory and Energy-Related Applications
Christopher Kuenneth et al.
ACS APPLIED NANO MATERIALS (2018)
Stability of the orthorhombic phase in (111)-oriented YO1.5-substituted HfO2 films
Takao Shimizu et al.
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN (2018)
Epitaxial growth of YO1.5 doped HfO2 films on (100) YSZ substrates with various concentrations
Takao Shimizu et al.
FERROELECTRICS (2017)
Kinetic pathway of the ferroelectric phase formation in doped HfO2 films
Lun Xu et al.
JOURNAL OF APPLIED PHYSICS (2017)
Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf0.5Zr0.5)O2 thin films deposited on various substrates
Takahisa Shiraishi et al.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (2017)
Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
Min Hyuk Park et al.
NANOSCALE (2017)
Si Doped Hafnium Oxide-A Fragile Ferroelectric System
Claudia Richter et al.
ADVANCED ELECTRONIC MATERIALS (2017)
Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films
Takahisa Shiraishi et al.
APPLIED PHYSICS LETTERS (2016)
Evidence for oxygen vacancies movement during wake-up in ferroelectric hafnium oxide
S. Starschich et al.
APPLIED PHYSICS LETTERS (2016)
Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO2 Thin Films
Everett D. Grimley et al.
ADVANCED ELECTRONIC MATERIALS (2016)
Ferroelectric HfO2-based materials for next-generation ferroelectric memories
Zhen Fan et al.
JOURNAL OF ADVANCED DIELECTRICS (2016)
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
Min Hyuk Park et al.
ADVANCED MATERIALS (2015)
Growth of epitaxial orthorhombic YO1.5-substituted HfO2 thin film
Takao Shimizu et al.
APPLIED PHYSICS LETTERS (2015)
Ferroelectricity in undoped hafnium oxide
Patrick Polakowski et al.
APPLIED PHYSICS LETTERS (2015)
On the structural origins of ferroelectricity in HfO2 thin films
Xiahan Sang et al.
APPLIED PHYSICS LETTERS (2015)
The origin of ferroelectricity in Hf1-xZrxO2: A computational investigation and a surface energy model
R. Materlik et al.
JOURNAL OF APPLIED PHYSICS (2015)
Stabilizing the ferroelectric phase in doped hafnium oxide
M. Hoffmann et al.
JOURNAL OF APPLIED PHYSICS (2015)
Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes
Min Hyuk Park et al.
APPLIED PHYSICS LETTERS (2014)
The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity
Min Hyuk Park et al.
APPLIED PHYSICS LETTERS (2014)
Study on the effect of heat treatment conditions on metalorganic-chemical-vapor-deposited ferroelectric Hf0.5Zr0.5O2 thin film on Ir electrode
Takao Shimizu et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
Impact of different dopants on the switching properties of ferroelectric hafniumoxide
Uwe Schroeder et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
Wake-up effects in Si-doped hafnium oxide ferroelectric thin films
Dayu Zhou et al.
APPLIED PHYSICS LETTERS (2013)
Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
Min Hyuk Park et al.
APPLIED PHYSICS LETTERS (2013)
Incipient Ferroelectricity in Al-Doped HfO2 Thin Films
Stefan Mueller et al.
ADVANCED FUNCTIONAL MATERIALS (2012)
Ferroelectricity in Simple Binary ZrO2 and HfO2
Johannes Mueller et al.
NANO LETTERS (2012)
Ferroelectricity in hafnium oxide thin films
T. S. Boescke et al.
APPLIED PHYSICS LETTERS (2011)
Ferroelectricity in yttrium-doped hafnium oxide
J. Mueller et al.
JOURNAL OF APPLIED PHYSICS (2011)
Development of hafnium based high-k materials-A review
J. H. Choi et al.
MATERIALS SCIENCE & ENGINEERING R-REPORTS (2011)
High-k dielectrics for future generation memory devices (Invited Paper)
J. A. Kittl et al.
MICROELECTRONIC ENGINEERING (2009)
Modeling of imprint in hysteresis loop of ferroelectric thin films with top and bottom interface layers
Z. Ye et al.
APPLIED PHYSICS LETTERS (2007)