Quantum dot formation on suspended graphene nanomesh by helium ion beam milling technology

We report on the successful observation of a single electron phenomenon on a large area suspended graphene nanomesh (GNM) device patterned by the helium ion beam milling (HIBM) technique. The HIBM can be used to further regular the shape of the suspended graphene nanoribbon after the conventional RIE process, and also drill the periodic nanopores on suspended graphene to build potential barriers. It provides a more practical way to use graphene for quantum technology.

Automated summary

The successful observation of a single electron phenomenon on a large area suspended graphene nanomesh device patterned by the helium ion beam milling technique provides a more practical way to use graphene for quantum technology.