Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Ru4-xTax (x = 1,2,3) alloys are studied as absorber candidates for EUV low-n mask. We report the morphology, surface roughness as well as the chemical composition of the as-deposited alloy films for better theoretical model building of the EUVL absorber stack. Their refractive indices are reconstructed by optimizing measured EUV reflectivity data for the purpose of enabling rigorous EUVL imaging calculations in the future work. The stabilities (both physical and chemical) of these absorber candidates are verified which contribute to a long lifetime of the mask in its working environment. This includes the resistance assessments of the thin films against high temperature up to 500 degrees C, different mask cleaning solutions and hydrogen environment which is present in EUV scanners. Etching of RuTa is explored using halogen-based reactive ion etch technique. A low etch rate is obtained with a moderate etch selectivity to Ru, which is the capping layer of multilayer mirror on a EUVL mask.

Automated summary

Ru4-xTax alloys are studied for EUV low-n mask absorber candidates, with reports on their morphology, surface roughness, and chemical composition for theoretical model building. Refractive indices are reconstructed by optimizing measured EUV reflectivity data. Stability assessments and etching exploration are conducted to ensure long lifetime and functionality in working environment.