期刊
C-JOURNAL OF CARBON RESEARCH
卷 7, 期 4, 页码 -出版社
MDPI
DOI: 10.3390/c7040067
关键词
nanolayered graphene thin film; two-dimensional nanomaterial; localized growth; plasma-enhanced atomic layer deposition
资金
- U.S. Department of Energy, Office of Basic Energy Sciences [DE-SC00112704]
- National Science Foundation [CBET-1740687, ECCS-1542174]
- Department of Defense [W911NF-16-1-0554]
Carbon thin films were successfully grown using PE-ALD method, and it was found that the presence of defective sites on the substrate could facilitate the formation of nanolayered carbon films. This finding could be beneficial for controlled growth of nanolayered carbon films or other two-dimensional nanomaterials with modern nanopatterning techniques.
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film. The grown film was analyzed by the high-resolution transmission electron micrograph (TEM), X-ray photoelectron spectroscopy (XPS) analysis, and Raman spectrum analysis. The analyses show that the PE-ALD-grown carbon film has an amorphous structure. It was found that the existence of defective sites (nanoscale holes or cracks) on the substrate of copper foil could facilitate the formation of nanolayered carbon films. The mechanism for the formation of nanolayered carbon film in the nanoscale holes was discussed. This finding could be used for the controlled growth of nanolayered carbon films or other two-dimensional nanomaterials while combining with modern nanopatterning techniques.
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