4.7 Article

Facile fabrication of stretchable photonic Ag nanostructures by soft-contact patterning of ionic Ag solution coatings

期刊

NANOPHOTONICS
卷 11, 期 11, 页码 2693-2700

出版社

WALTER DE GRUYTER GMBH
DOI: 10.1515/nanoph-2021-0812

关键词

ionic Ag ink; nanoimprint lithography; polarization-sensitive color filter; soft contact lithography; stretchable nanostructure; transfer printing

资金

  1. National Research Foundation of Korea (NRF) - Korean Government [2020R1F1A1073760]
  2. NRF - MSIT of the Korean government [NRF-2021M3H4A1A04086554]
  3. POSTECHSamsung Electronics Research Center program - Samsung Electronics [IO20121508187-01]
  4. Korea Institute for Advancement of Technology (KIAT) grant - Korea government (MOTIE) [P0002092]
  5. POSTECH Alchemist fellowship
  6. National Research Foundation of Korea [2020R1F1A1073760] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

We propose a rapid and simple method to create Ag nanostructures by using direct mechanical patterning and thermal annealing. The Ag nanostructures are obtained from ionic Ag ink coating that is spin-coated onto the desired substrate and then reduced by thermal annealing. The study systematically investigates the optimal patterning conditions and demonstrates the tunable photonic functionality of Ag architecture.
We describe a rapid and simple method to create Ag nanostructures by using direct mechanical patterning of ionic Ag ink coating under gentle pressure, then thermal annealing to reduce the ionic Ag ink to a metallic Ag layer. The ionic liquid-phase Ag coating is easily obtained by spin-coating ionic Ag ink that has appropriate Ag concentration and can be either printed or imprinted on the desired substrate by using a soft elastomer patterning mold, then reduced to the Ag nanostructure by subsequent thermal annealing. More specifically, we present two methods: transfer printing and soft nanoimprinting. In transfer printing, the ionic Ag ink is first inked onto the elastomer mold which then contacts the target substrate to transfer the Ag nanopattern. In soft nanoimprinting, the elastomer mold conducts soft imprinting to engineer the ionic Ag ink coating to the Ag nanostructure. We systematically investigate the optimal patterning conditions by controlling the initial Ag ink concentration and the coating, printing, imprinting, and annealing conditions, to derive Ag architecture that has tunable photonic functionality. As an example, we demonstrate polarization-sensitive reflective color filters that exploit shape-tunable Ag nanostructures fabricated by soft nanoimprinting using a controllably-stretched elastomer mold.

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