Factors affecting fabrication of silicon nanopillars using silica nanoparticle lithography and metal-assisted chemical etching

Different technologies have been explored for fabricating silicon nanopillars (SiNPs). One of the emerging technologies is the combined fabrication process based on silica nanoparticle lithography and metal-assisted chemical etching (MACE). However, the process flow to fabricate successfully SiNPs depends on various technology factors. We report investigations on factors affecting the fabrication technology, from the assembly of close-packed silica nanoparticle monolayers using drop-coating method, formation of nonclose packed silica nanoparticle monolayers using HF vapor etching, to creation of SiNPs using MACE. Etching mechanisms are suggested to explain observed experiment results. (C) 2022 Society of Photo-Optical Instrumentation Engineers (SPIE)

Automated summary

This study investigates the factors affecting the fabrication technology of silicon nanopillars. The process includes assembling close-packed silica nanoparticle monolayers using the drop-coating method, forming non-close packed silica nanoparticle monolayers using HF vapor etching, and creating SiNPs using metal-assisted chemical etching (MACE). The observed experimental results are explained through proposed etching mechanisms.