4.7 Article

Combinatorial magnetron sputtering of AgFeO2 thin films with the delafossite structure

期刊

MATERIALS & DESIGN
卷 91, 期 -, 页码 132-142

出版社

ELSEVIER SCI LTD
DOI: 10.1016/j.matdes.2015.11.092

关键词

Combinatorial sputtering; Delafossite; Thin film; AgFeO2

资金

  1. KIC InnoEnergy [41-2014-IP119-COMET]
  2. Swedish Centre for Smart Grids and Energy Storage (SweGRIDS) [38432-1]
  3. Knut och Alice Wallenberg (KaW) foundation
  4. Swedish Research Council (VR)

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The main objective of this study is to demonstrate the strength of the combinatorial approach to rapidly and effectively identify suitable process parameters for the synthesis of AgFeO2 filmswith layered delafossite structure. (00l)- textured delafossite AgFeO2 thin films have been successfully deposited for the first time without post-annealing by magnetron sputtering from elemental silver and iron targets in a reactive Ar-O-2 atmosphere. Gradient filmswith a wide composition range were deposited on singlewafers and subsequent screenings of phase- and chemical compositions were employed to optimize process parameters. The optimum deposition temperature for single-phase AgFeO2 growth was 450 degrees C using a Ag target powered at 15 W with a pulsing frequency of 150 kHz and a Fe target powered at constant 120 W at a total pressure of 4 mTorr and a O-2 partial pressure of 0.8 mTorr. Selected films were studied with scanning electron microcopy (SEM), transmission electron microscopy (TEM) and Raman spectroscopy. The optical band gap for the indirect transition in the AgFeO2 film was determined to 1.7 +/- 0.1 eV, and the band gap for the direct transition was 2.5 +/- 0.1 eV. The film showed insulating electrical properties. (C) 2015 The Authors. Published by Elsevier Ltd.

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