Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process

We consider the corona model and local thermal equilibrium approximations of a real plasma to measure the electron temperature (T-e) and density (n(e)), respectively, using the optical emission spectroscopy (OES) method in dual-frequency pulsed capacitively coupled plasmas (CCPs) in a reactive mixture of Ar/O-2/C4F8 at a low operating pressure. The operation conditions such as DC continuous and synchronized were used for the study and plasma characterization for the intended plasma application such as high aspect ratio etching (HARE). We show that the present plasma conditions are dominated by a corona balance rather than the supremacy of multi-step excitation. This fact has enabled us to utilize the modified Boltzmann plot technique to evaluate the T-e values. In the second method, we simultaneously used the Boltzmann and Saha equations to determine the n(e) value using the line intensity ratio and the value of T-e. Time-resolved measurements of T-e and n(e) were performed for completeness, and the insight of the pulsed discharge was investigated. Time evolution of n(e) and T-e using the OES method revealed a similar trend in the change of plasma parameters, indicating electron impact ionization during the pulse on phase. It was seen that n(e) in the afterglow speedily decreased within a short time of similar to 5 mu s. Analysis suggests the formation of afterglow plasmas, which are composed of positive and negative ions with very low electron density. The results revealed that the DC-synchronized operation could be useful for plasma application such as HARE due to different plasma characteristics. It also suggests the production of ion-ion plasmas by the effective utilization of negative ions in the afterglow phase. The corona balance condition was validated in our experiments, and the results were compared with the existing literature.

Automated summary

This study uses optical emission spectroscopy (OES) to measure the electron temperature and density in dual-frequency pulsed capacitively coupled plasmas (CCPs). The results show that the plasma conditions are dominated by a corona balance and reveal insights into the pulsed discharge.