Fluorinated β-diketonate complexes M(tfac)2(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films

Partially fluorinated beta-diketonate complexes M(tfac)(2)(TMEDA) (M = Fe 1, Ni 2, Cu 3, Zn 4; tfac = 1,1,1-trifluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethylethylenediamine) were synthesized and structurally (sc-XRD) and thermochemically (TGA) characterised. A new polymorph of Fe(tfac)(2)(TMEDA) was found. The structural and physicochemical properties of 1-4 were compared with related M(acac)(2)(TMEDA) and M(hfac)(2)(TMEDA) (acac = 2,4-pentanedionate, hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate) beta-diketonate complexes to evaluate the effect of the degree of fluorination. A positive effect on the thermal behaviour of the metal acetylacetonates was observed, but no discernible trends. Application of complexes 1-4 as precursors in a MOCVD process yielded either metal (Ni, Cu) or metal oxide thin films (Fe3O4, ZnO), which were further oxidized to NiO, CuO and alpha-Fe2O3 films by calcination in air at 500 degrees C.

Automated summary

Partially fluorinated beta-diketonate complexes were synthesized and compared with related complexes, showing positive thermal effects on metal acetylacetonates without clear trends. These complexes used as precursors in MOCVD process can yield metal or metal oxide thin films.