Atomistic structures of 0001 tilt grain boundaries in a textured Mg thin film

Nanocrystalline Mg was sputter deposited onto an Ar ion etched Si {100} substrate. Despite an similar to 6 nm amorphous layer found at the interface, the Mg thin film exhibits a sharp basal-plane texture enabled by surface energy minimization. The columnar grains have abundant 0001 tilt grain boundaries in between, most of which are symmetric with various misorientation angles. Up to similar to 20 degrees tilt angle, they are composed of arrays of equally-spaced edge dislocations. Ga atoms were introduced from focused ion beam milling and found to segregate at grain boundaries and preferentially decorate the dislocation cores. Most symmetric grain boundaries are type-1, whose boundary planes have smaller dihedral angles with {2110} rather than {1010}. Atomistic simulations further demonstrate that type-2 grain boundaries, having boundary planes at smaller dihedral angles with {1010}, are composed of denser dislocation arrays and hence have higher formation energy than their type-1 counterparts. The finding correlates well with the dominance of type-1 grain boundaries observed in the Mg thin film.

Automated summary

In this study, the grain boundary structure of nanocrystalline Mg thin film was investigated through experiments and atomistic simulations. The results show that there are abundant symmetric grain boundaries in the Mg thin film, most of which are type-1, while the formation energy of type-2 grain boundaries is higher.