4.8 Article

Aliovalent Ta-Doping-Engineered Oxygen Vacancy Configurations for Ultralow-Voltage Resistive Memory Devices: A DFT-Supported Experimental study

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 14, 期 30, 页码 34822-34834

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.2c0508934822

关键词

resistive memory; vacancy engineering; ultralow-voltage switching; conducting filaments; first-principles calculations

资金

  1. German Federal Ministry of Education of Research (BMBF) [03SF0451]
  2. Shiv Nadar University

向作者/读者索取更多资源

By doping appropriate cationic dopants, metal oxide-based RS devices can achieve excellent performance with low current, long retention time, and endurance at ultralow voltage. The presence of Vo configurations and columnar-like dendritic structures is crucial for achieving these characteristics.
Alteration of transport properties of any material, especially metal oxides, by doping suitable impurities is not straightforward as it may introduce multiple defects like oxygen vacancies (V-o) in the system. It plays a decisive role in controlling the resistive switching (RS) performance of metal oxide-based memory devices. Therefore, a judicious choice of dopants and their atomic concentrations is crucial for achieving an optimum V-o configuration. Here, we show that the rational designing of RS memory devices with cationic dopants (Ta), in particular, Au/Ti(1-x)TaxO(2-delta)/Pt devices, is promising for the upcoming non-volatile memory technology. Indeed, a current window of similar to 10(4) is realized at an ultralow voltage as low as 0.25 V with significant retention (similar to 10(4) s) and endurance (similar to 10(5) cycles) of the device by considering 1.11 at % Ta doping. The obtained device parameters are compared with those in the available literature to establish its excellent performance. Furthermore, using detailed experimental analyses and density functional theory (DFT)-based first-principles calculations, we comprehend that the meticulous presence of Vo configurations and the columnar-like dendritic structures is crucial for achieving ultralow-voltage bipolar RS characteristics. In fact, the dopant-mediated Vo interactions are found to be responsible for the enhancement in local current conduction, as evidenced from the DFT-simulated electron localization function plots, and these, in turn, augment the device performance. Overall, the present study on cationicdopant-controlled defect engineering could pave a neoteric direction for future energy-efficient oxide memristors.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据