4.8 Article

Second-harmonic-assisted four-wave mixing in chip-based microresonator frequency comb generation

期刊

LIGHT-SCIENCE & APPLICATIONS
卷 6, 期 -, 页码 -

出版社

CHINESE ACAD SCIENCES, CHANGCHUN INST OPTICS FINE MECHANICS AND PHYSICS
DOI: 10.1038/lsa.2016.253

关键词

four-wave mixing; Kerr frequency comb; microresonator; second-harmonic generation

类别

资金

  1. National Science Foundation [ECCS-1509578]
  2. Air Force Office of Scientific Research [FA9550-15-1-0211]
  3. DARPA PULSE program through AMRDEC [W31P40-13-1-0018]
  4. National Natural Science Foundation of China [6169190011/12, 61420106003]
  5. Beijing Natural Science Foundation [4172029]
  6. Marsden Fund
  7. Rutherford Discovery Fellowships of the Royal Society of New Zealand
  8. Div Of Electrical, Commun & Cyber Sys
  9. Directorate For Engineering [1509578] Funding Source: National Science Foundation

向作者/读者索取更多资源

Simultaneous Kerr comb formation and second-harmonic generation with on-chip microresonators can greatly facilitate comb self-referencing for optical clocks and frequency metrology. Moreover, the presence of both second-and third-order nonlinearities results in complex cavity dynamics that is of high scientific interest but is still far from being well-understood. Here, we demonstrate that the interaction between the fundamental and the second-harmonic waves can provide an entirely new way of phase matching for four-wave mixing in optical microresonators, enabling the generation of optical frequency combs in the normal dispersion regime under conditions where comb creation is ordinarily prohibited. We derive new coupled time-domain mean-field equations and obtain simulation results showing good qualitative agreement with our experimental observations. Our findings provide a novel way of overcoming the dispersion limit for simultaneous Kerr comb formation and second-harmonic generation, which might prove to be especially important in the near-visible to visible range where several atomic transitions commonly used for the stabilization of optical clocks are located and where the large normal material dispersion is likely to dominate.

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