4.4 Article

Insight on the Characterization of MoS2 Based Devices and Requirements for Logic Device Integration

期刊

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
卷 5, 期 11, 页码 Q3072-Q3081

出版社

ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0131611jss

关键词

-

资金

  1. Beyond CMOS program at imec
  2. Research Foundation-Flanders, Belgium (FWO)

向作者/读者索取更多资源

MoS2 based transistors are being explored as a promising candidate for different applications. The techniques employed to characterize these devices have been directly adapted from 3D semiconductors, without considering the validity of the assumptions. In this work, we discuss the limitations of two-probe (2P), four probe (4P) and transfer length methods (TLM) for extracting electrical parameters. Based on finite-element modeling, we provide design considerations for 4P structures to measure more accurately. Extracting the parameters from these techniques in the appropriate regimes, we identify contact resistance RC to be critical for scaled MoS2 devices. Using 4P and TLM measurements along with temperature dependent measurements, we derive further insights into the behavior of the RC in the subthreshold and linear regime. Additionally, we propose an empirical model for the on-state contact resistance. (C) The Author(s) 2016. Published by ECS. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据