Effect of deposition voltage on the properties of electrodeposited CdZrS thin films for solar cell application

The electrodeposition procedure was carried out utilizing a two-electrode system on fluorine-doped tin oxide (FTO) substrates, with the deposition voltage for CdS set at 1450 mV and for CdZrS at the range of 1450, 1550, and 1600 mV. The structural results show that both CdS and CdZrS thin films exhibit cubic structure. Surface image analysis shows that the FTO substrate was covered by film. The shape and grain size of the films is varied with deposition voltage. Elemental composition analysis confirmed the presence of desired elements Cd, Zr, and S on the deposited samples. CdS and CdZrS surfaces have an average surface roughness in the range of (3.2-19.6) nm. The optical properties of the films revealed a bandgap energy of 2.25 eV for CdS and (2.09-2.39) eV for CdZrS. The electrodeposited CdZrS thin films have potential applications as buffer layers in solar cell devices.

Automated summary

In this study, electrodeposition was used to fabricate CdS and CdZrS thin films on fluorine-doped tin oxide substrates. The results showed that both films had a cubic crystal structure, and surface analysis confirmed the coverage of the substrate by the films. The shape and grain size of the films varied with the deposition voltage.