Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes

In this study, a scatterometry-based monitoring system designed for tracking the quality and reproducibility of laser-textured surfaces in industrial environments was validated in off-line and real-time modes. To this end, a stainless steel plate was structured by direct laser interference patterning (DLIP) following a set of conditions with artificial patterning errors. Namely, fluctuations of the DLIP process parameters such as laser fluence, spatial period, and focus position are introduced, and also, two patterning strategies are implemented, whereby pulses are deliberately not fired at both deterministic and random positions. The detection limits of the system were determined by recording the intensities of the zero, first, and second diffraction order using a charge-coupled device (CCD) camera. As supported by topographical measurements, the system can accurately calculate spatial periods with a resolution of at least 100 nm. In addition, focus shifts of 70 mu m from the optimum focus position can be detected, and missing patterned lines with a minimum width of 28 mu m can be identified. The validation of this compact characterization unit represents a step forward for its implementation as an in-line monitoring tool for industrial laser-based micropatterning.

Automated summary

This study validated a scatterometry-based monitoring system for tracking the quality and reproducibility of laser-textured surfaces in industrial environments. The system can accurately calculate spatial periods, detect focus shifts, and identify missing patterned lines, providing an effective tool for in-line monitoring of industrial laser-based micropatterning.